C/C‐SiC component for metallic phase change materials
نویسندگان
چکیده
منابع مشابه
Metallic resist for phase-change lithography
Currently, the most widely used photoresists in optical lithography are organic-based resists. The major limitations of such resists include the photon accumulation severely affects the quality of photolithography patterns and the size of the pattern is constrained by the diffraction limit. Phase-change lithography, which uses semiconductor-based resists such as chalcogenide Ge₂Sb₂Te₅ films, wa...
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ژورنال
عنوان ژورنال: International Journal of Applied Ceramic Technology
سال: 2020
ISSN: 1546-542X,1744-7402
DOI: 10.1111/ijac.13570